• Applied Materials AMAT eMax CT3 chamber

    • Manufacturer: Applied Materials

      amat emax ct3 chamber manufactured 2007 division: semiconductor equipment | number of units: 1 | number of chambers: 1 | process capabilities: oxide-etch | wafer size range; set size: 300 mm

      No price
      Regensburg, Germany
    • 2007 Applied Materials AMAT eMax CT chamber

      • Manufacturer: Applied Materials

        amat emax ct chamber amat emax ct chamber dielectric etch chamber manufactured in 2007

        No price
        Regensburg, Germany
      • 2005 Applied Materials AMAT eMax CT plus chamber

        • Manufacturer: Applied Materials

          amat emax ct plus chamber manufactured 2005 division: semiconductor equipment | condition info: very good | number of units: 1 | number of chambers: 1 | process capabilities: oxide-etch | wafer size range; set si...

          No price
          Regensburg, Germany
        • Applied Materials AMAT Axiom strip chamber

          • Manufacturer: Applied Materials

            amat axiom strip chamber amat axiom strip chamber manufactured in 2007

            No price
            Regensburg, Germany
          • 2007 Applied Materials AMAT Enabler chamber

            • Manufacturer: Applied Materials

              amat enabler chamber manufactured 2007 division: semiconductor equipment | number of units: 2 | number of chambers: 1 | wafer size range; set size: 300 mm

              No price
              Regensburg, Germany