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1996 Tokyo Electron Ltd TEL Clean Track Mk7 N TEL Track Mk7 in Regensburg, Germany

Location:
Regensburg, Germany
Manufacturer:
Canon
Model:
TEL Clean Track Mk7 N

Specifications

Condition:
used
Year:
1996
Weight:
3,307 lb (1,500 kg)
Division:
Semiconductor Equipment
Ce marked:
YES
Bowl rinse:
YES
Wafer size:
200 mm
Condition info:
Very Good
Interface type:
Canon FPA i5
Wafer handling:
Standard Robot
Number of units:
1
Shipping weight:
lb kg
External cooling:
Water Cooled
Photoresist type:
Positive
Stepper interface:
YES
Power requirements:
110/230 V 100.0 A 50 Hz
Number of hot plates:
10
Process capabilities:
46wf/h
Wafer backside rinse:
YES
Number of chill plates:
5
Stepper interface type:
Canon FPA i5
Software revision level:
MK8 G2.38
Wafer edge bead removal:
YES
Wafer size range; maximum:
200 mm
Wafer size range; minimum:
200 mm
Exterior dimensions; depth:
140.157 in (356.0 cm)
Exterior dimensions; width:
53.543 in (136.0 cm)
Wafer size range; set size:
200 mm
Exterior dimensions; height:
80.709 in (205.0 cm)
Number of cassette elevators:
4
Number of developer dispensers:
1
Number of photoresist dispenses:
2
Number of vapor prime hot plates:
1
Number of vapor prime chill plates:
0
Number of developer rinse dispensers:
1
Number of photoresist develop stations:
2
Number of wafer edge exposure stations:
1

Description

Carrier Station C/S
2 Coater RRC/EBR,
R1 und R2 with GEN2 Pumps
2 Developer with
H-Nozzle and Rinse
1 AD Unit
8 Hotplates (Low Oven)
2 DHP
(High Oven)
5 Coolplates
1 WEE
1 Cup Wash function
Canon FPA i5 Interface
Temp./Hum. Unit for Coater
Solvent Supply for each Coater
Developer Supply for Dev.
T/C Rack for Resist, Developer and Motor flange temperature