- United States
- $85,000 USD
- Mark 50
CHA Mark 50C High Throughput E-Beam Deposition System with Ion Gun Assist. 32 in. x 32 in. water cooled cylindrical chamber simplifies loading and unloading. Inficon IC5 deposition rate controller. CHA SR10 electron beam power supply with sweep controls. 4 pocket e-gun with source selector. Quartz substrate heaters. MPS-3000FC ion beam power supply and ion gun. Currently configured for lift-off process with single substrate dome. CTI On-Board cryopump with 9600 compressor and roughing pump. System currently has an Advanced Energy MDX 2.5K DC magnetron power supply installed but there are no sputter sources currently installed.
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