Location:
Freehold Township, NJ
Price:
$99,000 USD
Model:
AK800

Specifications

Condition:
used
Stock number:
58630
Subcategory:
Pecvd - oxidation

Description

Silicon Nitride PECVD System. Plasma Enhanced Chemical Vapor Deposition system. The system uses gases (primarily silane and ammonia) to deposit thin layers of silicon nitride used in anti-reflective coating in solar industry. Using plasma excitation this is possible at low temperatures of 300-500 deg C. The system is constructed to be an R&D tool so it allows all kinds of thin film depositions (depending on gases used as sources). Process Area: 400mm x 450mm. Deposition Rates: Up to 500nm/min for Si-based films. Mfg.:2008. $69,000 AS IS. $99,000 Fully Tested.