Four Target Batch-Inline Sputtering System. The KDF 744i features full 200mm wafer capability. Using a pallet size of 19 in. x 19 in. a host of substrate sizes can be accommodated with this system. As in all inline KDF systems the user can easily change substrate sizes at will run to run. The 744i system also utilizes KDF’s family of in-house designed cathodes which cover the full spectrum of materials to be sputtered from dielectrics, magnetic materials to precious metals, KDF has a cathode to fit. The KDF 744i is equipped with all the latest in OEM technology like MKS cluster gauges and Advanced Energy pulsed power supplies. The advanced software features of the tool with a Windows 7® HMI are extensive including but not limited to auto cryo regeneration, auto pump and vent, programmable target burn-in, particle test mode, selectable slew modes, multi servo power mode selections, scan profile mode, multipass up to 9999 and repeat recipe mode.
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