- Trusted Seller
DI Water Spray Gun Kit for Wet Benches
The DI Water Spray Gun Kit with Recirculation Tee is a tool for wet benches in semiconductor manufacturing, providing precision cleaning and rinsing for sensitive processes. Designed for high-purity applications,...
Rocklin, CA - Trusted Seller
Vacuum Wand Kit for Wet Benches
This vacuum wand set is optimized for handling 200mm silicon wafers in wet bench applications. The system is ESD safe and configured for use with an external vacuum source, ensuring safe and reliable operation in...
Rocklin, CA - Trusted Seller
Ultrasonic Vibrator Bath for Wet Benches
The Kaijo Corporation Ultrasonic Vibrator Type 78S is designed for ultrasonic agitation in wet processing applications, commonly integrated into wet benches and ultrasonic process tanks. It provides consistent ul...
Rocklin, CA 
BELKIN A3L980-150-BLUS CAT6 UTP SNAGLESS PATCH CABLE 150ft - BRAND NEW
BELKIN A3L980-150-BLUS CAT6 UTP SNAGLESS PATCH CABLE 150ft - BRAND NEW P/N: A3L980-150-BLUS 150 FEET LONG MADE IN USA BRAND NEW CONDITION LOC OFF-03
Largo, FL
DISPOSABLE ESD GRD4560 HEEL GROUNDER FOR STATIC CONTROL - LOT OF 55 UNITS - NEW
DISPOSABLE ESD GRD4560 HEEL GROUNDER FOR STATIC CONTROL - LOT OF 55 UNITS P/N: GRD4560 LOT OF 55 UNITS BRAND NEW CONDITION LOC S-1
Largo, FL
TMP-150/200
This series of equipment is suitable for CMP polishing equipment for thin films (dielectric layers), including oxide, metal, STI, SOI, MEMS and other products of flat polishing. Adopting airbag film flexible pres...
Beijing, China
TFP-2310
The equipment is equipped with 3 polishing stations and 8 polishing heads, which has high processing efficiency. It has polishing disc cooling and temperature monitoring system to ensure the constant temperature ...
Beijing, China
Wintel LPR (Low-Pressure Removal)
- Manufacturer: Wintel
LPR (Low-Pressure Removal) PE ALD Poly Etcher HARC Doped ACL EER EUV Normal ashing process with unique plasma source is possible. In particular, excellent results can beobtained from low O2 & No O2 processes. Low...
Gyeonggi-do, South Korea
ICP lab type PR removal machine
- Manufacturer: Minder Hightech
Application ASHING Polymer removal DESCUM Dry removal of hard mask layer Photoresistance removal after female ion implantation Removal of optical resistance between media Photoresistance removal in BAW/SAW proces...
Guangzhou, China
Cassette type Batch plasma PR removal machine
- Manufacturer: Minder Hightech
Application: DESCUM Wafer cleaning Removing residual glue after wet process Surface residue removal Remove residual glue after exposure and development
Guangzhou, China
1018651-24 MPM Wipe Strip
- Manufacturer: Yinuo
Shenzhen, China
Panasonic CM 1001N NOZZLE KXFX037SA00
- Manufacturer: Panasonic
Shenzhen, China
NI CB-68LPR terminal block 777145-02
- Manufacturer: Yinuo
Shenzhen, China
Samsung Hanwha CN020 NOZZLE
- Manufacturer: Hanwha
Shenzhen, China
ASM SIEMENS 03059989 2039 Nozzle
- Manufacturer: ASMPT
Shenzhen, China
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