NanoFLux MM series in Vilnius, Vilnius County, Lithuania
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Specifications
- Condition
- new
- At 1064 nm
- ≤ 0.5 %
- At 532 nm 2) 3)
- 1500 mJ
- At 355 nm 2)
- 1000 mJ
- At 266 nm 2)
- 270 mJ
- Pulse repetition rate
- 10 Hz
- Press duration 4)
- 5 ± 1 ns
- At 532 nm
- ≤ 1 %
- At 355 nm
- ≤ 2 %
- At 266 nm
- ≤ 3 %
- Long-term power drift 6)
- ± 2 %
- Beam spatial profile 7)
- Super-Gaussian
- M2 8)
- ~5
- Beam diameter 9)
- ~ 18 mm
- Beam pointing stability 10)
- ≤ 50 µrad
- Beam divergence
- ≤ 0.5 mrad
- Optical pulse jitter 11)
- ≤ 0.5 ns
- Linewidth
- ≤ 1 cm-1
- Polarization
- linear
- Laser head size (w×l×h mm)
- 460 × 1250 × 260
- Power supply size (w×l×h mm)
- 550 × 600 × 1250
- Umbilical length 13)
- 5 m
- Power requirements 15)
- 208, 380 or 400 V AC,three phase, 50/60 Hz
- Power consumption 16)
- ≤ 5 kVA
- Water supply 16)
- ≤ 5 l/min, 2 Bar, max 15 °C
- Operating ambient temperature
- 22 ± 2 °C
- Storage ambient temperature
- 15 - 35 °C
- Relative humidity (non-condensing)
- ≤ 80 %
- Cleanness of the room
- ISO Class 7
- - g
- Provides a Gaussian-like beam profile
- - m20...90
- Provides a flat, smooth beam profile, without hot spots and diffraction rings in the near and medium field
- - rli
- Optional Relay Imaging for smooth beam profile
- - aw
- Water-air cooling option
- - n10...n20
- 10 - 20 ns pulse duration
- Subcategory
- Lasers
- Subcategory 2
- Machinery
- Listing ID
- 101103274
Description
Multimode (MM) High Energy Q-switched Nd:YAG Lasers
High energy NanoFLux MM series lasers are designed to produce high energy nanosecond pulses at 1064 nm. High pulse energy, excellent pulse-to-pulse energy stability, superior beam quality makes these systems well suited for applications like OPO or Ti: Sapphire pumping, material processing and plasma diagnostics and others.
High energy nanosecond lasers
Up to 10 J pulse energies
5 ns pulse duration
Up to 20 ns pulse duration options available
10 or 20 Hz pulse repetition rate
Better than 0.5% RMS pulse energy stability
Up to 90 M2 version available
High efficiency pump chambers and advanced beam shaping for maximum pulse energy extraction
Relay imaging between amplifier stages for smooth beam profile at the laser output
Thermally induced birefringence compensated
Optional temperature stabilized second, third, fourth and fifth harmonic generators
Low jitter internal/external synchronization
Robust and stable laser head