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- Trusted Seller

Myriad/Quintel/Kasper 2001
- Manufacturer: Myriad/Quintel/Kasper
Completely rebuilt and fully supported. Split field optics, 350 watt light source. Currently configured for 4″ wafers. 2″ and 3″ wafer conversion kits available. Resolution is 1-3 microns……(process dependent)
Billerica, MA - Trusted Seller

Karl Suss MA 150 Mask Aligner (Backside Alignment)
- Manufacturer: SÜSS MicroTec
- Model: MA150
MA150 Mask Aligner – Refurbished 150mm System with Backside Alignment We offer a refurbished SUSS MA150 Mask Aligner in excellent condition. This tool was recently running in a fab environment and is configured f...
Rocklin, CA - Trusted Seller
Shinko BX80-070974-11 300mm Wafer Prealigner SBX92101867 Trias Working Spare
- Manufacturer: Shinko
“Removed from a TEL Tokyo Electron Trias CF,CN,-,CO Radical Process Reactor System” Shinko BX80-070974-11 300mm Wafer Prealigner SBX92101867 TEL Trias Working Spare Inventory # A-17408 Model No: SBX92101867 Remov...
Albuquerque, NM - Trusted Seller

Mask Aligners
- Manufacturer: Unknown
EVG6200? Infinity Automated Double Side Mask Alignment System (up to 200mm, double side, automated handling) General Exposure modes: hard-, soft- and vacuum contact, proximity Separation distance 0-300 ?m adj...
Bree, Ireland 
MCXJ-MLS8 Maskless lithography System Equipment specifications
MCXJ-MLS8 Maskless lithography System Sample: Equipment structure diagram Exposure host structure diagram Equipment specifications
Guangzhou, China
MDLB-ASD2C2D automatic coating and developing machine
MDLB-ASD2C2D automatic coating and developing machine The equipment adopts a stainless steel frame, and the inner and outer sheet metal are stainless steel mirror panels. The bottom of the equipment is equipped w...
Guangzhou, China
MDXN-25D4 High precision mask aligner
MDXN-25D4 High precision mask aligner Purpose and characteristics This equipment is mainly used for the development and production of small and medium-sized integrated circuits, semiconductor components, and surf...
Guangzhou, China
MDXN-31D2 Mask aligner
MDXN-31D2 Mask aligner Purpose and characteristics Mainly used for the development and production of small and medium-sized integrated circuits, semiconductor components, optoelectronic devices, surface aco...
Guangzhou, China
MDXN-31D4 High precision double-sided lithography machine
MDXN-31D4 High precision double-sided lithography machine Purpose and characteristics This equipment is mainly used for the development and production of small and medium-sized integrated circuits, semiconductor ...
Guangzhou, China
MDXN-25X High precision single side lithography machine
MDXN-25X High precision single sided lithography machine Purpose and characteristics This equipment is a precision lithography machine developed by our company specifically for the use characteristics of lithogra...
Guangzhou, China
