Used Deposition Equipment (Cvd, Pvd) in China

CARBON NANOTUBE MOVING BED

The moving bed (tubular cracking furnace) is a device for catalytic cracking hydrocarbons to produce carbon nanotubes In the production process of mobile method, the catalyst is fixed. The moving bed (tubular cra...

SAGGER AUTOMATLC DISTRIBUTOR

The sagger automatic distributor has a high degree of automation, without manual intervention, stable operation, precise precise filling, and stable can be used to produce fillers for mullite, corundum made, coru...

Vacuum system

• Manufacturer: Super Q

CVD Tube Furnace

CVD split type tube furnace Three gas channels with MFC High purity quartz tube Products Description CVD tube furnace is composed of a tubular heating furnace, MFC gas system and vacuum system. The heating furnac...

CVD Mini Tube Furnace

1.1200C CVD mini tube furnace 2.Spilt door type 3.30 or 50segments temperature controller,PID control,±1℃ 4.Three gas channles system float flowmeter. 5.H2 burning and inspection system included Products Descript...

Casting Capped End

Kdk-125: Copper | Kdk-128: Copper

AIRPORT

PVD Physical vapor deposition

PVD Physical vapor deposition Product introduction: It is widely used in the batch production of semiconductor and LED production lines, and can meet the various process requirements for the uniform deposition of...

CVD equipment for graphene and carbon nanotube materials

CVD equipment for graphene and carbon nanotube materials Product introduction The equipment is mainly used for the process coating of graphene and nano materials; Diffusion, oxidation and annealing of polycrystal...

PECVD Plasma enhanced chemical vapor deposition equipment

PECVD Plasma enhanced chemical vapor deposition equipment Product introduction ◆ Fully automatic control of process time, temperature, gas flow, valve action and reaction chamber pressure is realized by industria...

MDICP-5000F Fully automatic ICP etching machine

MDICP-5000F Fully automatic ICP etching machine 1．System overview ▲Executive summary The equipment is a two chamber vacuum system. One chamber is the injection sampling chamber and the other is the etching chambe...

MDPS-560 Pyriform Double Chamber Sputtering System

Used for preparing single/multi-layer functional nanofilms including various hard, metallic, semiconducting and dielectric films for universities and science institutions. Sputtering vacuum chamber, magnetron spu...

Heterojunction plate type PECVD

Heterojunction plate type PECVD

High temperature PECVD process

High temperature PECVD process

Reactive ion etching system

Reactive ion etching system Project configuration and machine structure diagram Process result Silicon-based material etching Silicon-based materials, nano-imprint patterns, array patterns and lens pattern etchin...