PCB solder mask exposure machine
new
Its reasonable design and stable performance improve the work efficiency and the quality of the products greatly. This machine is equipped LED light sources, greatly saving energy, cover different wavelengths, gr...
Beijing, China
MDXN-31D2 Mask aligner
new
MDXN-31D2 Mask aligner Purpose and characteristics Mainly used for the development and production of small and medium-sized integrated circuits, semiconductor components, optoelectronic devices, surface aco...
Guangzhou, China
MDXN-25D Mask aligner
new
MDXN-25D Mask aligner Purpose and characteristics This equipment is a precision lithography machine developed by our company specifically for the use characteristics of lithography machines in various colleges an...
Guangzhou, China
MDXN-43D4 High precision mask aligner
new
MDXN-43D4 High precision mask aligner Purpose and characteristics This equipment is designed according the needs of market. Can do substrate below 100*100mm. it suitable for one time exposure product. Can do like...
Guangzhou, China
MDXN-25D4 High precision mask aligner
new
MDXN-25D4 High precision mask aligner Purpose and characteristics This equipment is mainly used for the development and production of small and medium-sized integrated circuits, semiconductor components, and surf...
Guangzhou, China
MDHS-AL8 8" Fully automatic single-sided lithography machine
new
MDHS-AL8 8" Fully automatic single-sided lithography machine 1、 Technical parameters: 18. Foot cushion airbag Like recognition and automatic alignment systems, alignment workbenches, loading robots, unloading ro...
Guangzhou, China
MDXN-25X High precision single side lithography machine
new
MDXN-25X High precision single sided lithography machine Purpose and characteristics This equipment is a precision lithography machine developed by our company specifically for the use characteristics of lithogra...
Guangzhou, China
MCXJ-MLS8 Maskless lithography System Equipment specifications
new
MCXJ-MLS8 Maskless lithography System Sample: Equipment structure diagram Exposure host structure diagram Equipment specifications
Guangzhou, China
MDLB-ASD2C2D automatic coating and developing machine
new
MDLB-ASD2C2D automatic coating and developing machine The equipment adopts a stainless steel frame, and the inner and outer sheet metal are stainless steel mirror panels. The bottom of the equipment is equipped w...
Guangzhou, China
MDXN-31D4 High precision double-sided lithography machine
new
MDXN-31D4 High precision double-sided lithography machine Purpose and characteristics This equipment is mainly used for the development and production of small and medium-sized integrated circuits, semiconductor ...
Guangzhou, China
Spin coater without temperature
new
---Spin Coater The Spin Coater is a device that drips all kinds of glue on a high-speed rotating substrate and uses centrifugal force to uniformly coat the glue on the substrate. The thickness of the film depends...
Guangzhou, China
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