ICP PLASMA Photoresist Remover
new
Application: ASHING Polymer removal Dry removal of hard mask layer Photoresistance removal after ion implantation Photoresistance removal in BAW/SAW process Dry cleaning of anti reflective graphic film layer Surf...
Guangzhou, China
RIE PLASMA Photoresist Remover
new
Application: Silicon carbide etching Surface cleaning after etching DESCUM Hard mask layer, dry removal Silicon oxide or silicon nitride etching Removal of optical resistance between media Surface residue removal
Guangzhou, China
Cassette type Batch plasma PR remover off line
new
- Manufacturer: Minder Hightech
Application: DESCUM Wafer cleaning Removing residual Photoresist after wet process Surface residue removal Remove residual Photoresist after exposure and development
Guangzhou, China
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