Ulvac
new
- Manufacturer: Ulvac
Highly reliable thermal processing system with over thirty years of can be used for heat treatment such as oxidation, diffusion, and anneling of 200mm silicon wafers. Horizontal furnace used as oxidation furnace,...
Munich, GermanyUlvac
new
- Manufacturer: Ulvac
Our LED Mass Productive System NE-950EX is equipped with 2 of our patented inventions and offers beside a outstanding output capacity, high maintainability, stability, reliability by its innovative design. Higher...
Munich, GermanyUlvac
new
- Manufacturer: Ulvac
The Ion Implanter IH-860DSIC is a system especially designed for mass production with high temp ESC for SiC. Parallel beam high temperature ion implanter for SiC devices 100mm/150mm wafer available up to 500C wit...
Munich, GermanyUlvac
new
- Manufacturer: Ulvac
Batch type equipment of chemical dry cleaning for remoral of native oxide in Narrow and Deep-contact patterns of advanced semiconductor. Damage-free (remote plasma and low-temperature process) High throughput and...
Munich, GermanyUlvac
new
- Manufacturer: Ulvac
The Enviro-1Xa advanced plasma resist strip system from ULVAC is the latest photoresist removal equipment offering exceptional performance at an incredible price. Specifically designed for non-300mm fabs, it is e...
Munich, Germany
Ulvac
new
- Manufacturer: Ulvac
The SME Series (SME-200) is a series of space-saving, low-cost cluster-type sputtering systems ideal for SAW devices and compound semiconductors.The SME-series lets you create a highly cost-effective line tailore...
Munich, Germany
Ulvac
new
- Manufacturer: Ulvac
Dry etching system for high volume production with good cost performance and wide selection of tool configuration. GaN Recess with selectivity to AlGaN >350 precise etch stop using laser interferometry EPD low da...
Munich, Germany
Ulvac
new
- Manufacturer: Ulvac
Production type dry etching system with ULVAC original NLD (Neutral Loop Discharge) Plasma Source. ICP type etching chamber, CCP or Ashing chamber is also selectable as 2nd chamber. Low process pressure, high den...
Munich, GermanyUlvac
new
- Manufacturer: Ulvac
CME-200E/400 is the most suitable model in the PE-CVD series production system for deposition of Si films with application as Insulator or barrier layers. High-density plasma process with high-frequency (27.12 MH...
Munich, Germany
Ulvac
new
- Manufacturer: Ulvac
NE550H is a multipurpose high-density plasma etching system, specifically for R&D test facilities such as universities and government agencies. Equipped with low-pressure, low-electron-temperature and high-densit...
Munich, Germany
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