Ulvac
new
- Manufacturer: Ulvac
Batch type equipment of chemical dry cleaning for remoral of native oxide in Narrow and Deep-contact patterns of advanced semiconductor. Damage-free (remote plasma and low-temperature process) High throughput and...
Munich, GermanyUlvac
new
- Manufacturer: Ulvac
Production type dry etching system with ULVAC original NLD (Neutral Loop Discharge) Plasma Source. ICP type etching chamber, CCP or Ashing chamber is also selectable as 2nd chamber. Low process pressure, high den...
Munich, GermanyUlvac
new
- Manufacturer: Ulvac
Dry etching system for high volume production with good cost performance and wide selection of tool configuration. GaN Recess with selectivity to AlGaN >350 precise etch stop using laser interferometry EPD low da...
Munich, GermanyUlvac
new
- Manufacturer: Ulvac
NE550H is a multipurpose high-density plasma etching system, specifically for R&D test facilities such as universities and government agencies. Equipped with low-pressure, low-electron-temperature and high-densit...
Munich, Germany