Branson IPC L3200
used
- Manufacturer: Branson
Dual quartz chambers for 100-150mm wafers, cassette to cassette operation. Features: Automatic pick-and-place wafer handling Automatic pneumatic soft-lift assemblies for each chamber in-line gas filters (0.05 mic...
San Jose, CA
Branson IPC 4000 Barrel Asher
used
- Manufacturer: Branson
Features: Wafer capability up to 8" RF generator model PM119 Two process gas capability Specifications: Wafer capaility up to 8" 10" quartz chamber
San Jose, CA
GaSonics IPC Series 9104 Plasma Asher
used
- Manufacturer: GaSonics
The GaSonics 9104 is a plasma asher from the GaSonics IPC series. Features: 12" (diamater) 20" (D) quartz chamber System includes 4 MFC's 1000W automatch network Temperature probe Multistep / multirecipe capabili...
San Jose, CA
SPEC 3510E PC Isotropic Etch System
used
- Manufacturer: GaSonics
SPEC Equipment has developed the new GaSonics L3510E PC isotropic etching system. Designed for high etch rates, the 3510 PC provides isotropic profiles along with the ability to etch or ash at low temperatures. T...
San Jose, CA
Anatech 600 Series Model SP150 Quartz Barrel Plasma Asher / Desum
used
- Manufacturer: Anatech
Anatech 600 Series Model SP150 Quartz Barrel Plasma Asher / Desum Specifications: Barrel Plasma Asher / Desum Model SP150 Quartz 300W, 13.56Mhz Power Supply Two gas input Quartz Chamber 10" diameter x 18" long 9"...
San Jose, CA
Oxford Instruments Plasmalab 800 Plus PECVD with 460mm diameter electrode (2009)
used
- Manufacturer: Oxford
- Model: PlasmaLab 800
Large Capacity Open Loaded Plasma Enhanced Chemical Vapor Deposition System. 460mm diameter electrode offers a capacity of up to twelve 4 in. wafers. Ideally suited for batch PECVD processing where excellent ac...
Plasmatherm SLR 770 shuttle lock ICP inductively coupled plasma etch system for compound semiconductor process
used
- Manufacturer: Plasma-Therm
- Model: SLR
Plasmatherm SLR-770 ICP Shuttle Lock Inductively Coupled Plasma Etch System. Configured for etching of metals and compound semiconductors Previous usage was deep etching of GaAs with chlorine chemistry PC cont...
Plasmatherm SLR720 shuttle lock RIE for compound semiconductor etching
used
- Manufacturer: Plasma-Therm
- Model: SLR-720
Plasmatherm SLR-720 RIE tool Configured for etching of metals and compound semiconductors Previous usage was etching of GaAs with chlorine chemistry PC controller. Vacuum load lock with wafer transfer robot. ...
Plasma-Therm 730 SLR PECVD Load-Locked System
used
- Manufacturer: Plasma-Therm
- Model: SLR
Plasma Shuttle-Lock load-lock loading system with platen transfer. Features: Windows operating system Top electrode is RF powered and the substrate is temperature controlled. Inlcudes vacuum pump with roots blowe...
San Jose, CA
Matrix 105 Asher System
used
- Manufacturer: Matrix
- Model: 105
Model 105 low temperature asher. Features: Single wafer Single cassette Microprocessor controlled menu-driven Multi-step program (three steps + over etch) process program Wafer lift pin assembly (up and down) Tem...
San Jose, CA
Tegal 903E Plasma Etch System
used
- Manufacturer: Tegal
Cassette to cassette single wafer plasma etcher system. Features: Cassette to Cassette Pick and Place Wafer Handling Specifications: Modularized for ease of Service Flow ranges: 1. 0-15 sccm (N2 calibrated) 2. 0-...
San Jose, CA
Branson IPC L2101
used
- Manufacturer: Branson
Branson/IPC Mod. S2100-11220 Reactor Center Features: One 12" (Diamter) x 20" (D) quartz chamber Three channel controller with three rotometer gas flow controllers Built in temperature controller for preheat in C...
San Jose, CA
GaSonics AE2001 Etch System
used
- Manufacturer: GaSonics
Microwave downstream etcher. Features: Cassette to cassette wafer handling Front and backside etching Variable platen temperature Alumina (ceramic) plasma tube Fluorine compatible chamber SECS II interface Multip...
San Jose, CA
GaSonics Aura 1000
used
- Manufacturer: GaSonics
The GaSonics Aura 1000 single-wafer photoresist asher is an automated tool designed as a flexible downstream plasma photoresist removal system for high-volume wafer fabrication. GaSonics offers the Aura in direct...
San Jose, CA
GaSonics PEP Iridia
used
- Manufacturer: GaSonics
The GaSonics PEP Iridia is a dual chamber etcher used to independently deskin (remove a crusted layer of photoresist without penetrating a lower layer of conventional photoresist) or to independently remove photo...
San Jose, CA
ENI GHW-85A Surface Treatment / Cleaning
used
- Manufacturer: ENI
- Model: GHW-85A
Good condition ENI GHW-85A Surface Treatment / Cleanings. Located in USA and other countries. Click request price for more information.
USA
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