- Trusted Seller
2005 SSEC 3300 Wafer clean
- Manufacturer: SSEC
- Model: 3300
150mm and 200mm Capable Post DRIE etch TSV cleaning is essential to the reliability of 2.5D and 3D IC devices. SSEC’s proprietary soak and spray technology minimizes spray time and chemistry use for lower cost-...
United States 
SSEC 3302 Resist Removal and Wafer Cleaning Machine
- Manufacturer: SSEC
- Model: M3302
SSEC CLEAN 3300 MODEL: M3302 208 VAC, 3PH, 60Hz, 30 AMP Date of Mfg. 8/30/05 AC Dwg No. 330i1712 1) the wafer is soaked in the mix of solvents (so-called cleaning by submersion) 2) there is processing by spray so...
Santa Barbara, CA- Trusted Seller
United States
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