- Shenzhen, China
PVD Physical vapor deposition
PVD Physical vapor deposition Product introduction: It is widely used in the batch production of semiconductor and LED production lines, and can meet the various process requirements for the uniform deposition of...
Guangzhou, ChinaPECVD Plasma enhanced chemical vapor deposition equipment
PECVD Plasma enhanced chemical vapor deposition equipment Product introduction ◆ Fully automatic control of process time, temperature, gas flow, valve action and reaction chamber pressure is realized by industria...
Guangzhou, China- Guangzhou, China
Inductive coupling plasma etching (icp) system
Inductive coupling plasma etching (icp) system Project configuration and machine structure diagram Process result Quartz / silicon / grating etching Using BR mask to etch quartz or silicon materials, the grating ...
Guangzhou, ChinaMDICP-5000F Fully automatic ICP etching machine
MDICP-5000F Fully automatic ICP etching machine 1.System overview ▲Executive summary The equipment is a two chamber vacuum system. One chamber is the injection sampling chamber and the other is the etching chambe...
Guangzhou, ChinaMDPS-560 Pyriform Double Chamber Sputtering System
Used for preparing single/multi-layer functional nanofilms including various hard, metallic, semiconducting and dielectric films for universities and science institutions. Sputtering vacuum chamber, magnetron spu...
Guangzhou, China- Guangzhou, China
- Guangzhou, China
Reactive ion etching system
Reactive ion etching system Project configuration and machine structure diagram Process result Silicon-based material etching Silicon-based materials, nano-imprint patterns, array patterns and lens pattern etchin...
Guangzhou, ChinaCVD equipment for graphene and carbon nanotube materials
CVD equipment for graphene and carbon nanotube materials Product introduction The equipment is mainly used for the process coating of graphene and nano materials; Diffusion, oxidation and annealing of polycrystal...
Guangzhou, China