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    2015 Ulvac NE 950 EX

    2015 Ulvac NE 950 EX RIE Etch System

    • Manufacturer: Ulvac
    • Model: NE-950EX

    - With process gases BCl₃, Cl₂, SiCl₄, CF₄, SF₆, C₄F₈, O₂, and Ar, this versatile ICP etcher is designed to etch GaN, sapphire, metals, ITO, SiC, AlN, ZnO and others - Patented ICP with magnetic confinement (“ISM...

    United States