Ulvac XeF2 release etch cluster tool FRE-200E
- Manufacturer: Ulvac
- Model: FRE-200E
ULVAC - XeF2 Etch Release FRE-200E Manufacturer: ULVAC Model: FRE-200E Equipment Details: RF Power supply. Voltage: 208V Frequency: 60Hz Phase, Wire: 3Phase, 3Wire+ G Line Full Load Current: 142A Max Load(unit): ...
Santa Barbara, CA- Trusted Seller
Trim, Ireland - Trusted Seller
2010 TEL Trias K CVD sytem
- Manufacturer: Tokyo Electron - TEL
- Model: Trias
CVD System, 12” <45nm process Vintage 2010 2 Chambers: CVD & ALD Process: NiOx, HfOx Trias cluster: 2 Loadports LM: Front end Main power distribution (MPD) Transfer module, TM EX reactor, PM2: Plasma capab...
Europe Ulvac
- Manufacturer: Ulvac
Batch type equipment of chemical dry cleaning for remoral of native oxide in Narrow and Deep-contact patterns of advanced semiconductor. Damage-free (remote plasma and low-temperature process) High throughput and...
Munich, Germany
Ulvac
- Manufacturer: Ulvac
Dry etching system for high volume production with good cost performance and wide selection of tool configuration. GaN Recess with selectivity to AlGaN >350 precise etch stop using laser interferometry EPD low da...
Munich, Germany
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